Quartz wafer substrate .
Quartz wafer substrates no yɛ wafers a wɔde quartz a ɛkorɔn-purity quartz (Sio2), a wɔde di dwuma kɛse wɔ semiconductors, optoelectronics, micro-electromechanical systems (MEMS), optical mfiri, ne mmeae afoforo. Ase hɔ no yɛ quartz wafer substrates ho nnianim asɛm a ɛkɔ akyiri .
Nkyerɛmu
Nneɛma a ɛwɔ mu .
(1) Ahotew a ɛkorɔn : mpɛn pii no wɔde quartz a wɔayɛ no (sɛ nhwɛso no, costed silica) na ɛyɛ, a ɛho tew kɛse koraa ( ɛboro anaasɛ ɛne 99.99%) yɛ pɛ na efĩ kakraa bi na ɛwɔ mu na ama wɔakwati sɛ ɛbɛka mfiri no adwumayɛ.
(2) Ɔhyew a ɛyɛ den : Ɔhyew mu ntrɛwmu a ɛba fam (≈0.55×10⁻⁶/℃) ne nea ɛkorɔn-ɔhyew a ɛko tia (softening point ~1600℃), a ɛfata ma kɔ soro-temperature akwan horow.
(3) Optical performance : broad transmission range (UV to IR), a ɛwɔ UV transmittance soronko, a eye ma photomasks, lenses, ne nea ɛkeka ho.
(4) Nnuru a ɛnyɛ adwuma : Ɛko tia acid ne alkali (gye hydrofluoric acid), a ɛfata ma etching akwan a ɛyɛ nsu.
(5) Electrical Insulation : High resistivity (>101⁶ Ω·cm), a ɛyɛ papa ma insulating substrates anaasɛ ɛkorɔn-frequency mfiri.
Applications .
Semiconductor a wɔyɛ .
Photomask a ɛwɔ ase hɔ .
EUV lithography no mu nneɛma .
Nneɛma a wɔde fa wafer ho .
Photonics & Optoelectronics .
Optical waveguide substrates .
Laser diode a wɔde si so .
Quantum kɔmputa afã horow .
Nneɛma titiriw a wɔde di dwuma .
Mems Resonator Bases .
Ahunmu afiri a wɔde hwɛ akyirikyiri nneɛma a ɛwɔ hɔ .
Ɔsoro-ahoɔden laser nhyehyɛe ahorow .
Nneɛma a wɔyɛ .
1 raw material synthesis : Wɔnam vapor deposition so na ɛyɛ (sɛ nhwɛso no, SICL₄ oxidation) anaasɛ abɔde mu quartz a wɔtew ho.
.
3 twa : Wɔde diamond wire saw anaasɛ laser twitwa a wɔatwitwa no ayɛ no wafers a ɛyɛ tratraa.
4 Grinding ne Polishing : Nnuru a wɔde yɛ nneɛma a wɔde yɛ polish (CMP) no nya nanometer-level smoothness.
5 Ahotew ne Nhwehwɛmu : Nneɛma nketenkete ne dade a wɔde yɛ efĩ a woyi fi hɔ, na ɛno akyi no, sintɔ ne parameter sɔhwɛ.
Agyapadeɛ
|
Nneɛma a ɛwɔ nipadua mu . |
Nneɛma a ɛsom bo . |
|
Ahotew . |
＞99.99% |
|
Muduro |
2.2g/cm .3 |
|
Nneɛma a ɛda adi pefee . |
＞90% |
|
Mohs a ɛyɛ den . |
5.5--6.5 |
|
Deformation Point . |
1280℃. |
|
Nneɛma a ɛma ɛyɛ mmerɛw . |
1750℃. |
|
Annealing Point . |
1250℃. |
|
Ɔhyew pɔtee ({0}}℃) . |
670J/kg. anoɔden |
|
Ɔhyew a ɛkɔ nipadua no mu (20℃) . |
1.4W/M. anoɔden |
|
Ɔhyew a ɛkɔ nipadua no mu (W/MK,1000℃) . |
1.0-1.2 |
|
Refractive index . |
1.4585 |
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Ɔhyew mu ntrɛwmu ho nsusuwii . |
5.510 -7cm/cm. anoɔden |
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Ɔhyew - adwumayɛ hyew . |
1750 ~ 2050℃. |
|
Ntiantiaa - term service temperature . |
1450℃. |
|
tenten - term service ɔhyew . |
1100℃. |
|
Nnuru a ɛwɔ mu . |
Nneɛma a ɛsom bo . |
|
Acid a ɛko tia . |
Acid a ano yɛ den(gye HF), alkali a ano yɛ den, organic solution . |
|
Ɔhyew a ɛkɔ soro a ɛko tia corrosion . |
Asɛnka nni ho |
|
Metal efĩ a ɛwɔ mu . |
.55 ppm . |
|
Ɛlektrik ahoɔden . |
Nneɛma a ɛsom bo . |
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Resistivity . |
7107ω.cm . |
|
Ahoɔden a ɛwɔ insulation mu . |
250 ~ 400kv/cm . |
|
dielectric daa . |
3.7~3.9 |
|
Dielectric absorption nsusuwii . |
＜410-4 |
|
Dielectric adehwere nsusuwii . |
＜110-4 |
|
Mfiridwuma mu nneɛma . |
Nneɛma a ɛsom bo . |
|
Ahoɔden a ɛwɔ nhyɛso mu . |
1100mpa . |
|
Ahoɔden a ɛwɔ benkum so . |
67mpa . |
|
Ahoɔden a ɛyɛ den sɛ ɛbɛtwetwe . |
48MPa . |
|
Poisson n’afã horow . |
0.14~0.17 |
|
Young's Modulus . |
72000mpa . |
|
Shear modulus . |
31000MPa . |
Dɛn nti na ɛsɛ sɛ yɛpaw yɛn:
Nneɛma a wɔayɛ no sɛnea wopɛ:
Fa wo nneɛma no yɛ no sɛnea wopɛ sɛnea w’ahiade te .
24 intanɛt so dwumadie:
Di wo nsɛm ho dwuma wɔ bere mu .
Bo a wɔde si akan:
Factory bo nanso ɛkorɔn-quality .
Wiase nyinaa po so ahyɛn:
Ɔpon-kɔ{1}}ɔpon ano aduru .
FAQ .
Q1: Dɛn ne quartz wafer substrates kɛse a ɛsen biara a ɛwɔ hɔ?
A: Standard production a ɛkɔ 300mm diameter, a 450mm prototypes wɔ hɔ ma R&D.
Q2: Wobɛtumi de customized thickness profiles ama?
A: Yiw, yebetumi ayɛ:
Wedged wafers (ma laser dwumadie) .
Precision tapered designs .
Mesa-nhyehyɛe a wɔahyehyɛ .
Q3: Ahotew protocol bɛn na wokamfo kyerɛ?
A: Standard RCA Clean Process: .
1. Nneɛma a ɛwɔ nipadua no mu (h2So4: H2O2) .
2. Ionic a wɔde tew ho (HCL: H2O2) .
3. HF-a etwa to ma hydrophilic soro .
Tags a ɛyɛ hyew .: Quartz Wafer Substrate, China Quartz Wafer Substrate Nnwumayɛfo, Wɔn a Wɔde Ma, Adwumayɛbea .
Send Inquiry .
Ebia w’ani begye ho nso .
